Faculty Directory

Adomaitis, Raymond A.

Adomaitis, Raymond A.

Chemical and Biomolecular Engineering
The Institute for Systems Research
Maryland Energy Innovation Institute
2255 A.V. Williams Building


Ph.D., Illinois Institute of Technology, 1988


Fellow, AICHE

Systems modeling and simulation; semiconductor and thin film processing.

Professor Adomaitis currently teaches or has previously taught the following courses:

  • ENCH 250: Computer Methods in Chemical Engineering
  • ENCH 300: Chemical Engineering Thermodynamics
  • ENCH 400: Chemical Engineering Thermodynamics
  • ENCH 446: Process Engineering Economics and Design II
  • ENCH 468L/648L: Photovoltaics: Solar Energy

Travis, C. D. and R. A. Adomaitis, "Modeling ALD Surface Reaction and Process Dynamics using Absolute Reaction Rate Theory,'' Submitted for publication (2012).     

Adomaitis, R. A. and A. Schwarm "Systems and Control Challenges in Photovoltaic Manufacturing Processes - A Modeling Strategy for Passivation and Anti-reflection Films,'' Proc. CPC VIII, Savannah, GA (2012).     

Adomaitis, R. A. "A Ballistic Transport and Surface Reaction Model for Simulating Atomic Layer Deposition Processes in High Aspect-Ratio Nanopores,'' Chemical Vapor Deposition, 17 (2011) 353-365, DOI: 10.1002/cvde.201106922.   

Adomaitis, R. A. "Ballistic Transport and Reaction Modeling of Atomic Layer Deposition Manufacturing Processes,'' Proc. 2011 IFAC World Congress, Milan (2011).    

Arana-Chavez, D., E. Toumayan, F. Lora, C. McCaslin, and R. A. Adomaitis "Modeling the Transport and Reaction Mechanisms of Copper Oxide CVD,'' Chemical Vapor Deposition 16 (2010) 336-345, DOI: 10.1002/cvde.201006873.    

Adomaitis, R. A. "Development of a Multiscale Model for an Atomic Layer Deposition Process,'' J. Crystal Growth 312 (2010) 1449-1452, DOI: 10.1016/j.jcrysgro.2009.12.041.    

Guglietta, G. T. Wanga, R. Pati, S. Ehrman, and R. A. Adomaitis "Chemical Vapor Deposition of Copper Oxide Films for Photoelectrochemical Hydrogen Production,'' Proc. of SPIE Vol. 7408 740807-1, Solar Hydrogen and Nanotechnology IV, F. Osterloh, Ed. (2009).    

Dwivedi, V. and R. A. Adomaitis "Multiscale Simulation and Optimization of an Atomic Layer Deposition Process in a Nanoporous Material,'' ECS Transactions 25 (2009) 115-122, DOI: 10.149/1.3207582.    

Leon, M. del Pilar and R. A. Adomaitis "Full Wafer Mapping and Response Surface Modeling Techniques for Thin Film Deposition Processes,'' J. Crystal Growth 311 (2009) 3399-3408.    

Oliver, J. D., B. H. Ponczak, R. P. Parikh, and R. A. Adomaitis "Uniformity Improvement of Planetary Epitaxial Growth Processes through Analysis of Intentionally Stalled SiC Wafers,'' Mat. Sci. Forum, 615-617 (2009) 101-104.    

Adomaitis, R. A. "The Nearest Uniformity Producing Profile (NUPP) Optimization Criterion for Thin-Film Processing Applications,'' J. Process Control 18 (2008) 922-930.    

Sreenivasan, R., R. A. Adomaitis, and G. W. Rubloff "A Comparative Study of Reactor Designs for the Production of Graded Films with Applications to Combinatorial CVD,'' J. Crystal Growth 310 (2008) 270-283.    

Adomaitis, R. A. "Intentionally Patterned and Spatially Non-Uniform Film Profiles in Chemical Vapor Deposition Processes,'' Surface and Coatings Technology 201 (2007) 9025-9029.   

Cai, Y., L. Henn-Lecordier, G. W. Rubloff, R. Sreenivasan, J.-O. Choo, and R. A. Adomaitis, "Multiplexed Mass Spectrometric Sensing in a Spatially Programmable Chemical Vapor Deposition System,'' J. Vac. Sci. Tech. B 25 (2007) 1288-1297.    

Adomaitis, R. A., I. G. Kevrekidis, and R. de la Llave, "A Computer-Assisted Study of Global Dynamic Transitions for a Non-Invertible System,'' Int. J. Bifurcation Chaos 17 (2007) 1305-1321.    

Adomaitis, R. A. "The Trouble with Spurious Eigenvalues,'' Int. J. Bifurcation Chaos 17 (2007) 1375-1381.    

Parikh, R. P., R. A. Adomaitis, J. D. Oliver, and B. H. Ponczak "Implementation of a Geometrically-based Criterion for Film Uniformity Control in a Planetary SiC CVD Reactor System,'' J. Process Control 17 (2007) 477-488.    

Parikh, R. P., R. A. Adomaitis, M. E. Aumer, D. Partlow, D. Thomson, and G. W. Rubloff ``Validating Gallium Nitride Growth Kinetics Using a Precursor Delivery Showerhead as a Novel Chemical Reactor,'' J. Crystal Growth 296 (2006) 15-26.    

Sreenivasan, R. R. A. Adomaitis, and G. W. Rubloff :A Demonstration of Spatially Programmable Chemical Vapor Deposition: Model-Based Uniformity/Non-uniformity Control.'' J. Vac. Sci. Tech. B 24 (2006) 2706-2715.

Chen, J. and R. A. Adomaitis "An Object-Oriented Framework for Modular Chemical Process Simulation with Semiconductor Processing Applications,'' Computers & Chem. Eng, 30 (2006) 1354-1380.

Parikh, R. P. and R. A. Adomaitis "An Overview of Gallium Nitride Growth Chemistry and its Effect on Reactor Design: Application to a Planetary Radial-Flow CVD System,'' J. Crystal Growth 286 (2006) 259-278.

Cho, S. G. W. Rubloff, M. E. Aumer, D. B. Thomson, D. P. Partlow, R. Parikh, and R. A. Adomaitis "In-situ Chemical Sensing in AlGaN/GaN HEMT MOCVD Process for Real-Time Prediction of Product Crystal Quality and Advanced Process Control,'' J. Vac. Sci. Tech. B 23 (4) (2005) 1386-1397.

Choo, J. O., R. A. Adomaitis, L. Henn-Lecordier, Y. Cai, and G. W. Rubloff "Development of a Spatially Controllable Chemical Vapor Deposition Reactor with Combinatorial Processing Capabilities,'' Review of Scientific Instruments, 76, 062217 (2005). 

Adomaitis, R. A. "Identification of a Deposition Rate Profile Subspace Corresponding to Spatially-Uniform Films in Planetary CVD Reactors: A New Criterion for Uniformity Control,'' Computers & Chem. Eng, 29 (2005) 829-837.

Choo, J. O., R. A. Adomaitis, G. W. Rubloff, L. Henn-Lecordier, and Y. Liu "Simulation-Based Design and Experimental Evaluation of a Spatially Controllable Chemical Vapor Deposition Reactor,'' AIChE Journal, 51 (2005) 572-584.

Adomaitis, R. A. "A Reduced-Basis Discretization Method for Chemical Vapor Deposition Reactor Simulation,'' Mathematical and Computer Modeling, 38 (2003) 159-175. 

Adomaitis, R. A. "Objects for MWR,'' Computers & Chem. Eng, 26 (2002) 981-998.

Adomaitis, R. A. "Spectral Filtering for Improved Performance of Collocation Discretization Methods,'' Computers & Chem. Eng, 25 (2001) 1621-1632.    

Lin, Y.-h. and R. A. Adomaitis, "Simulation and Model Reduction Methods for an RF Plasma Glow Discharge,'' Journal of Computational Physics, 171 (2001) 731-752.    

Chang, H. -Y., R. A. Adomaitis, J. N. Kidder, Jr., and G. W. Rubloff, "Influence of Gas Composition on Wafer Temperature in a Tungsten Chemical Vapor Deposition Reactor: Experimental Measurements, Model Development, and Parameter Estimation,'' J. Vac. Sci. Tech. B, 19 (2001) 230-238; also ISR TR 2000-09.

Rico-Martinez, R., R. A. Adomaitis, and I. G. Kevrekidis, "Noninvertibility in Neural Networks,'' Computers & Chem. Eng, 24 (2000) 2417-2433.    

Adomaitis, R. A. and Y. -h. Lin, "A Collocation/Quadrature-Based Sturm-Liouville Problem Solver,'' Applied Math. and Computation, 110 (2000); 205-223; also ISR TR 99-1.

Adomaitis, R. A., Y. -h. Lin, and H. -Y. Chang, "A Computational Framework for Boundary-Value Problem Based Simulations,'' Simulation, 74 (2000) 28-38. 

Lin, Y. -h., H. -Y. Chang, and R. A. Adomaitis, "MWRtools: A Library for Weighted Residual Method Calculations'' Computers & Chem. Eng, 23 (1999) 1041-1061; also ISR TR 98-24.    

Theodoropoulou, A., E. Zafiriou, and R. A. Adomaitis, "Inverse Model Based Real-Time Control for Temperature Uniformity of RTCVD,'' IEEE Trans. Semicond. Manuf., 12 (1999) 87-101.    

Chang, H. -Y. and R. A. Adomaitis, "Analysis of Heat Transfer in a Chemical Vapor Deposition Reactor: An Eigenfunction Expansion Solution Approach,'' Int. J. Heat Fluid Flow, 20 (1999) 74-83; also ISR TR 97-84.    

Lin, Y. -h. and R. A. Adomaitis, "A Global Basis Function Approach to DC Glow Discharge Simulation,'' Phys. Lett. A, 243 (1998) 142-150; also ISR TR 97-81.    

Adomaitis, R. A. and Y. -h. Lin, "A Technique for Accurate Collocation Residual Calculations,'' Chem. Engng J., 71 (1998) 127-134; also ISR TR 98-6.    

Theodoropoulou, A., R. A. Adomaitis, and E. Zafiriou, "Model Reduction for RTCVD Optimization,'' IEEE Trans. Semicond. Manuf. 11 (1998) 85-98; also ISR TR 97-78.