Faculty Directory

Oehrlein, Gottlieb S.

Oehrlein, Gottlieb S.

Fellow, AVS
Fellow, International Plasma Chemistry Society
Fellow, International Union of Pure and Applied Chemistry
Materials Science and Engineering
Institute for Research in Electronics & Applied Physics
Maryland Energy Innovation Institute
2119 Chemical and Nuclear Engineering Building


  • Ph.D., Physics, State University of New York at Albany, 1981
  • M.S., Physics, State University of New York at Albarny, 1978
  • Vordiplom, Physics, Wurzburg University, Germany, 1976


Professor Oehrlein received a Vordiplom in physics from Würzburg University (Germany) in 1976, and M.S. and Ph.D. degrees in physics from the State University of New York at Albany in 1978 and 1981, respectively. Prior to joining the A. James Clark School of Engineering at the University of Maryland in 2000, Professor Oehrlein was a member of the Department of Physics faculty at the State University of New York–Albany from 1993 to 2000, and a research staff member in IBM's Division of Research at the T.J. Watson Research Center, in Yorktown Heights, NY.


  • Distinguished Scholar-Teacher Award, University of Maryland (2024)
  • Nishizawa Award, International Symposium on Dry Process (2019)
  • John Thornton Memorial Award, American Vacuum Society (2019)
  • Most Valuable Reviewer, Journal of Vacuum Science and Technology (2019)
  • Fellow, International Plasma Chemistry Society (2017)
  • IBM Faculty Award (2010)
  • Plasma Prize, Plasma Science and Technology Division, American Vacuum Society (2005)
  • Invention of the Year Finalist for Method and Device for Nanoscale Plasma Processing of Materials (US Patent #7470329), UMD Office of Technology Commercialization (2003)
  • IBM Faculty Award (2002)
  • Fellow, International Union of Pure and Applied Chemistry (2000)
  • Fellow, American Vacuum Society (1998)
  • Thinker Award of Tegal Corporation, SEMICON West (1993)
  • Electronics Division Award of the Electrochemical Society (1992)
  • Six IBM Invention Plateau Awards (1982-1993)
  • IBM Outstanding Technical Achievement Award (1989)
  • Solid State Science and Technology Young Author's Award of the Electrochemical Society (1985)
  • State University of New York Chancellor's Honors Convocation Award for Academic Excellence and a Distinguished Dissertation (1982)
  • Fellow of the Institute of International Education, New York (1980)
  • Presidential Fellow, State University of New York, Albany (1978-1981)

Google Scholar

Professor Oehrlein's research interests include scientific and technological aspects of materials processing using partially ionized gases or plasmas.  Low-temperature plasmas are characterized by a gas temperature that remains close to ambient temperature, whereas the electron and ion temperatures can be much higher.  These kinds of plasmas enable unique processing of advanced materials at both low pressure and atmospheric pressure.  A great deal of the work in Prof. Oehrlein's research group is focused on understanding the interactions of plasma with surfaces of materials and how plasma-surface interactions may be controlled to alter properties of materials in desirable ways.

  • Applications of low-temperature plasma science and technology to materials processing
  • Surface chemistry and physics of thin film growth
  • Etching and modification
  • Plasma-surface and plasma-polymer interactions
  • In-situ plasma and surface diagnostics
  • Physics and chemistry of ion-induced surface processes and of imaging and templating materials
  • Nanoscale structure and device fabrication and characterization
  • Surface and bulk defects of materials


For a complete list of publications, please visit Professor Oehrlein's web site

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2020 Dean's Doctoral Student Research Awards

The competition recognizes distinguished graduate student researchers in order to help propel their careers and demonstrate the value of high-quality engineering research.

Reza Ghodssi named AVS Fellow

Citation reads: "For outstanding leadership in microsystems technology achieved by combining knowledge of materials and processing, innovative device concepts, and diverse applications."

Bartis Wins Wylie Fellowship for Research on Plasma for Disinfection

Award supports students in final stages of dissertation work.

Liu Inducted as ISI Highly Cited Researcher

ECE professor recognized for high number of citations his publications received from fellow researchers.

Plasma for Disinfection Study Wins DOE Grant

Oehrlein, Seog will be first to characterize effects on biological molecules at the monolayer level.

Oehrlein Receives IBM Faculty Award

Gift recognizes importance of nanofabrication research to electronics industry.

Lynen Fellow Vogli Joins MSE, IREAP

Visiting scholar chooses Clark School based on faculty members' international reputations.

Other professional society fellows

  • International Plasma Chemistry Society (2017)
  • International Union of Pure and Applied Chemistry (2000)
  • American Vacuum Society (1998)